What sets the magnitude of the Hooge noise parameter?
In plain words
The strength of 1/f noise per charge carrier, measured by a number called the Hooge parameter, differs by many orders of magnitude between materials and samples. No theory predicts it from a material's structure and defect content.
Precise statement
In $S_R(f)/R^{2} = \alpha_H/(N_c f)$, measured $\alpha_H$ spans more than four orders of magnitude between high-quality crystals and disordered films, around the originally proposed universal value 2e-3. For one material class (for example metal films or doped Si), determine how $\alpha_H$ depends on the density and type of mobile defects, whether the noise arises from mobility or carrier-number fluctuations, and derive $\alpha_H$ from a microscopic fluctuator model with independently measured defect parameters.
What would settle it
$\alpha_{\mathrm{H}}$ measured on a sample series with controlled, independently quantified defect density, reproduced by a fluctuator model without free parameters.
Related problems
- Special case of Why is 1/f resistance noise nearly universal in solids?